Anishchik, V. M.; Harushka, V. A.; Pilipenka, U. A.; Ponariadov, V. V.; Saladukha, V. A. Redistribution of Impurity in Ion-Doped Layers During Fast Heat Treatment of Gate Dielectric. Журнал Белорусского государственного университета. Физика 2019, No. 2, 48-53. https://doi.org/10.33581/2520-2243-2019-2-48-53.