Odzaev VB, Plebanovich VI, Tarasik MI, Chelyadinskii AR. About the influence of elastic stresses on the implanted boron diffusion in silicon. Журнал Белорусского государственного университета. Физика. 2017;(3):88-94. Accessed July 17, 2026. https://journals.bsu.by/index.php/physics/article/view/461