ODZAEV, Vladimir B.; PLEBANOVICH, Vladimir I.; TARASIK, Mariya I.; CHELYADINSKII, Aleksei R. About the influence of elastic stresses on the implanted boron diffusion in silicon. Journal of the Belarusian State University. Physics, [S. l.], n. 3, p. 88–94, 2017. Disponível em: https://journals.bsu.by/index.php/physics/article/view/461. Acesso em: 17 jul. 2026.