V. B. Odzaev, V. I. Plebanovich, M. I. Tarasik, and A. R. Chelyadinskii, “About the influence of elastic stresses on the implanted boron diffusion in silicon”, Журнал Белорусского государственного университета. Физика, no. 3, pp. 88–94, Sep. 2017, Accessed: Jul. 17, 2026. [Online]. Available: https://journals.bsu.by/index.php/physics/article/view/461