Odzaev, Vladimir B., Vladimir I. Plebanovich, Mariya I. Tarasik, and Aleksei R. Chelyadinskii. “About the Influence of Elastic Stresses on the Implanted Boron Diffusion in Silicon”. Journal of the Belarusian State University. Physics, no. 3 (September 29, 2017): 88–94. Accessed July 17, 2026. https://journals.bsu.by/index.php/physics/article/view/461.