Odzaev VB, Plebanovich VI, Tarasik MI, Chelyadinskii AR. About the influence of elastic stresses on the implanted boron diffusion in silicon. Журнал Белорусского государственного университета. Физика [Internet]. 2017 Sep. 29 [cited 2026 Jul. 17];(3):88-94. Available from: https://journals.bsu.by/index.php/physics/article/view/461