Formation of epitaxial InSb films on semi-insulating GaAs(100) by explosive thermal evaporation: their structure and electrical properties

Authors

Keywords:

indium antimonide, film, substrate, vacuum deposition, structure, electrical properties

Abstract

In the present work, the influence of the deposition temperature of InSb films on semi-insulating GaAs(100) on their phase composition, crystal perfection and electrical properties was investigated. The InSb films of various extent of crystal perfection are formed by means of explosive thermal deposition of InSb on semi-insulating GaAs(100) substrates in the temperature range of 375–460 °C. X-ray diffraction analysis established that the films are heteroepitaxial. It is shown that an increase in the deposition temperature of InSb films from 375 to 460 °C leads to a change in the film surface roughness (Ra) from 3.4 to 19.1 nm. The Hall voltage sensitivity to the magnetic field of InSb films varies in the range of 500–1500 mV/T. The electron concentration (n) and mobility (μ) changes in the range of 2 ⋅ 1016 – 6 ⋅ 1016 cm–3, 10 ⋅ 103 – 21 ⋅ 103 cm2/(V ⋅ s). The formed InSb films on semi-insulating GaAs(100) substrate are of practical interest for the manufacture of highly sensitive miniature Hall devices.

Author Biographies

  • Evgenia A. Kolesnikova, Belarusian State University, 4 Niezaliežnasci Avenue, Minsk 220030, Belarus

    trainee of junior researcher at the laboratory of physics of ion-plasma modification of solids, department of solid state physics, faculty of physics

  • Vladimir V. Uglov, Belarusian State University, 4 Niezaliežnasci Avenue, Minsk 220030, Belarus

    doctor of science (physics and mathematics), full professor; head of the department of solid state physics, faculty of physics

  • Andrey K. Kuleshov, Belarusian State University, 4 Niezaliežnasci Avenue, Minsk 220030, Belarus

    PhD (physics and mathematics); head of the laboratory of physics of ion-plasma modification of solids, department of solid state physics, faculty of physics

  • Dmitry P. Rusalsky, Belarusian State University, 4 Niezaliežnasci Avenue, Minsk 220030, Belarus

    PhD (physics and mathematics); leading researcher at the laboratory of physics of ion-plasma modification of solids, department of solid state physics, faculty of physics

References

  1. Hass G, Thun RE, editors. Advances in research and development. New York: Academic Press; 1969. [341 p.]. Moscow: Mir; 1972. p. 140–244 (Physics in thin films; volume 5). Russian edition: Khass G, Tun RE, editors. Sovremennoe sostoyanie issledovanii i tekhnicheskie primeneniya. Moscow: Mir; 1972. 334 p. (Fizika tonkikh plenok; tom 5).
  2. Bolvanovich EI. Poluprovodnikovye plenki i miniatyurnye izmeritel’nye preobrazovateli [Semiconductor films and miniature measuring transducers]. Minsk: Nauka i tekhnika; 1981. 214 p. Russian.
  3. Villardson R, Gering Kh, editors. Poluprovodnikovye soedineniya AIIIB V [Semiconductor compounds AIII BV]. Vigdorovich VN, Nashel’skii AYa, translators. Moscow: Metallurgiya; 1967. 727 p. Russian.
  4. Chang LL, Ploog K, editors. Molecular beam epitaxy and heterostructures. Dordrecht: Springer; 1985. 728 p. Russian edition: Dzhois BA, Khekingbottom R, Menkh U. Molekulyarno-luchevaya epitaksiya i geterostruktury. Cheng L, Plog K, Alferov ZhI, Shmartsev YuV, editors; Alferov ZhI, Shmartsev YuV, translators. Moscow: Mir; 1989. 582 p.
  5. Zhang T, Clowes SK, Debnath M, Bennett A, Roberts C, Harris JJ, et al. High-mobility thin InSb films grown by molecular beam epitaxy. Applied Physics Letters. 2004;84(22):4463–4465. DOI: 10.1063/1.1748850.
  6. Gulyaev AM, Shitnikov AS. Effect of an excess of components on the electrical properties of indium antimonide films. Fizika i tekhnika poluprovodnikov. 2015;2(49):214–218. Russian.
  7. Ivanov A, Smirnov B. Electron beam deposition: technology and equipment. Nanoindustriya. 2012;6:28–34. Russian.
  8. Tripathi RRSN, Kumar AV, Vishwakarma SR. Electrical characterization of electron beam evaporated indium antimonide thin films. Archives of Physics Research. 2011;2(2):100–106.
  9. Vishwakarma SR, Kumar A, Tripathi RSN, Das R, Das S. Fabrication and characterization of n-InSb thin film of different thickness. Indian Journal of Pure & Applied Physics. 2013;51:260–266.
  10. Taher A. Effect of substrate temperature on the properties of vacuum evaporated thin InSb films. Daffodil International University Journal of Science and Technology. 2018;13(1):39–43.
  11. Maissel LI, Glang R. Handbook of thin film technology. New York: McGraw-Hill; 1970. 800 p.
  12. Kuchis EV. Metody issledovaniya effekta Kholla [Methods of investigating the Hall effect]. Moscow: Sovetskoe radio; 1974. 328 p. Russian.
  13. Kobus A, Tushinskii Ya. Hall devices and magnetic resistors. Moscow: Energiya; 1971. 352 p. Russian.
  14. Kas’yan VA, Ketrush PI, Nikol’skii YuA, Pasechnik FI. Tonkie plenki antimonida indiya: poluchenie, svoistva, primenenie [Indium antimonide thin films: preparation, properties, application]. Syrbu NN, editor. Kishinev: Shtiinca; 1989. 161 p. Russian.
  15. Baranochnikov ML. Mikromagnitoelektronika. Tom 2 [Micromagnetoelectronics. Tom 2]. Moscow: DMK Press; 2002. 681 p. Russian.

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Published

2021-10-20

How to Cite

(1)
Kolesnikova, E. A.; Uglov, V. V.; Kuleshov, A. K.; Rusalsky, D. P. Formation of Epitaxial InSb Films on Semi-Insulating GaAs(100) by Explosive Thermal Evaporation: Their Structure and Electrical Properties. Журнал Белорусского государственного университета. Физика 2021, No. 3, 20-25. https://doi.org/10.33581/2520-2243-2021-3-20-25.