Anishchik VM, Harushka VA, Pilipenka UA, Ponariadov VV, Saladukha VA. Influence of the rapid thermal treatment of the initial silicon wafers on the process of their pyrogenic oxidation. Журнал Белорусского государственного университета. Физика. 2019;(2):81-85. Accessed July 17, 2026. https://journals.bsu.by/index.php/physics/article/view/489