ANISHCHIK, Victor M.; HARUSHKA, Valiantsina A.; PILIPENKA, Uladzimir A.; PONARIADOV, Vladimir V.; SALADUKHA, Vitali A. Application of the rapid thermal treatment for annealing the ion-doped layers of polysilicon. Journal of the Belarusian State University. Physics, [S. l.], n. 2, p. 63–68, 2017. Disponível em: https://journals.bsu.by/index.php/physics/article/view/441. Acesso em: 17 jul. 2026.