V. M. Anishchik, V. A. Harushka, U. A. Pilipenka, V. V. Ponariadov, and V. A. Saladukha, “Application of the rapid thermal treatment for annealing the ion-doped layers of polysilicon”, Журнал Белорусского государственного университета. Физика, no. 2, pp. 63–68, May 2017, Accessed: Jul. 17, 2026. [Online]. Available: https://journals.bsu.by/index.php/physics/article/view/441