Physical processes in a laser source of aluminum ions with the controlled energy for nanofilm deposition

  • Victor K. Goncharov A. N. Sevchenko Institute of Applied Physical Problems, Belarusian State University, Kurčatava Street, 7, 220108, Minsk, Belarus
  • Mikhail V. Puzyrev Yanka Kupala State University of Grodno, Ažeška Street, 22, 230023, Grodno, Belarus
  • Valery Y. Stupakevich A. N. Sevchenko Institute of Applied Physical Problems, Belarusian State University, Kurčatava Street, 7, 220108, Minsk, Belarus

Abstract

The physical processes in a laser source of aluminum ions for deposition of nanofilms have been considered. The electric scheme of an ion source with two power supplies has been substantiated. Power supplies were independent of each other. The ion source represented a target that was exposed to the effect of laser radiation, the substrate and a grid located between them. From the erosive a laser plume, the charged particles (electrons and ions) moved to the substrate. Aluminum nanofilm was formed on the substrate due to the flux of aluminum ions. The conditions under which the charged particles moving to the substrate after the grid were represented mainly by ions have been found experimentally. The time characteristics of the ion flux within the grid-substrate space have been determined at various constant positive potentials of the grid with respect to the substrate and at several power densities of laser radiation. In our experiments, the target-grid distance was 6 cm, the grid-substrate distance was 6 cm, the grid transparency was 86 %. The laser target was made of aluminum (Al 1070). The power density of laser radiation was varying as (from 2.54 to 5.41) ⋅ 108 W/cm2. It has been shown that the technological regimes of nanofilm deposition may be controlled using a positive potential at the grid relative to the substrate by changes in the ion flux to the substrate and in its duration. Besides, deposition of nanofilms may be controlled by changes in the power density of laser radiation and by resistance of the charge leakage from the substrate.

Author Biographies

Victor K. Goncharov, A. N. Sevchenko Institute of Applied Physical Problems, Belarusian State University, Kurčatava Street, 7, 220108, Minsk, Belarus

doctor of science (physics and mathematics), full professor; head of the laboratory of laser plasma dynamics

Mikhail V. Puzyrev, Yanka Kupala State University of Grodno, Ažeška Street, 22, 230023, Grodno, Belarus

PhD (physics and mathematics), docent; leading researcher of the laboratory of laser plasma dynamics

Valery Y. Stupakevich, A. N. Sevchenko Institute of Applied Physical Problems, Belarusian State University, Kurčatava Street, 7, 220108, Minsk, Belarus

senior lecturer at the department of information systems and technologies, physico-technical faculty

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Published
2017-09-29
Keywords: erosive laser plasma, aluminum target, plasma ion source
How to Cite
Goncharov, V. K., Puzyrev, M. V., & Stupakevich, V. Y. (2017). Physical processes in a laser source of aluminum ions with the controlled energy for nanofilm deposition. Journal of the Belarusian State University. Physics, 3, 79-87. Retrieved from https://journals.bsu.by/index.php/physics/article/view/460
Issue
No 3 (2017): Journal of the Belarusian State University. Physics
Section
Condensed State Physics

Copyright (c) 2017 Journal of the Belarusian State University. Physics

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