Surface morphology of cadmium telluride films prepared by vacuum sputtering on the silicon and cadmium telluride substrates

  • Aziza T. Akobirova Tajik National University, 17 Rudaki Avenue, Dushanbe 734025, Tajikistan
  • Victoryia I. Halauchyk Belarusian State University, 4 Niezaliežnasci Avenue, Minsk 220030, Belarus
  • Michail G. Lukashevich Belarusian State University, 4 Niezaliežnasci Avenue, Minsk 220030, Belarus
  • Nizom S. Sultonov Tajik National University, 17 Rudaki Avenue, Dushanbe 734025, Tajikistan
  • Rajabmurod B. Hamroqulov Tajik National University, 17 Rudaki Avenue, Dushanbe 734025, Tajikistan

Abstract

The results of atomic-force and scan electron microscopy of cadmium telluride films prepared on silicon and monocrystall in cadmium telluride substrates by means of sputtering in quasi-closed volume are presented. It is shown that mean grain size of the obtained films ranging in the interval 2.5–5.0 µm with roughness of the films changing in the range 34,1–87,5 nm. Etching of films bromine-butyl etchant results in improved surface morphology and roughness of the film reduces to 17.9 nm. The elemental composition of the film surface layer was determined by X-ray microanalysis and structure by X-ray diffractometer.

Author Biographies

Aziza T. Akobirova, Tajik National University, 17 Rudaki Avenue, Dushanbe 734025, Tajikistan

PhD (physics and mathematics); associate professor at the department of physical electronics, faculty of physics

Victoryia I. Halauchyk, Belarusian State University, 4 Niezaliežnasci Avenue, Minsk 220030, Belarus

student at the faculty of physics

Michail G. Lukashevich, Belarusian State University, 4 Niezaliežnasci Avenue, Minsk 220030, Belarus

doctor of science (physics and mathematics), full professor; professor at the department of semiconductors and nanoelectronic, faculty of physics

Nizom S. Sultonov, Tajik National University, 17 Rudaki Avenue, Dushanbe 734025, Tajikistan

doctor of science (physics and mathematics); professor at the department of physical electronics, faculty of physics

Rajabmurod B. Hamroqulov, Tajik National University, 17 Rudaki Avenue, Dushanbe 734025, Tajikistan

PhD (physics and mathematics); associate professor at the department of physical electronics, faculty of physics

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Published
2017-05-30
Keywords: cadmium telluride, substrate, film, atomic-force and scan electron microscopy
Supporting Agencies This work was performed in framework of Agreement on cooperation between the Belarusian State University and the Tajik National University. The authors are grateful to L. V. Baran, S. V. Gusakova, and S. V. Zlotsky for help in making the measurements and discussing the results.
How to Cite
Akobirova, A. T., Halauchyk, V. I., Lukashevich, M. G., Sultonov, N. S., & Hamroqulov, R. B. (2017). Surface morphology of cadmium telluride films prepared by vacuum sputtering on the silicon and cadmium telluride substrates. Journal of the Belarusian State University. Physics, 2, 69-75. Retrieved from https://journals.bsu.by/index.php/physics/article/view/442
Issue
No 2 (2017): Journal of the Belarusian State University. Physics
Section
Semiconductor Physics and Engineering

Copyright (c) 2017 Journal of the Belarusian State University. Physics

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